The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Mar. 17, 2017
Applicant:

Indian Institute of Science, Bangalore, IN;

Inventors:

Srinivasan Raghavan, Bangalore, IN;

Hareesh Chandrasekar, Bangalore, IN;

Nagaboopathy Mohan, Bangalore, IN;

Dhayalan Shakthivel, Bangalore, IN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/20 (2006.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01); H01L 29/04 (2006.01); H01L 29/16 (2006.01); C30B 25/18 (2006.01); C30B 25/04 (2006.01); C30B 29/40 (2006.01); C30B 29/60 (2006.01);
U.S. Cl.
CPC ...
H01L 29/2003 (2013.01); C30B 25/04 (2013.01); C30B 25/186 (2013.01); C30B 29/406 (2013.01); C30B 29/605 (2013.01); H01L 21/0242 (2013.01); H01L 21/0254 (2013.01); H01L 21/02433 (2013.01); H01L 21/02458 (2013.01); H01L 21/02645 (2013.01); H01L 21/02653 (2013.01); H01L 21/76871 (2013.01); H01L 29/1608 (2013.01); H01L 29/045 (2013.01);
Abstract

The present invention provides a metal nitride platform for semiconductor devices, including, a pre-defined array of catalyst sites, disposed on a substrate. Metal nitride islands with lateral to vertical size ratios of at least greater than one (1) are disposed on the array of catalyst sites, where the surfaces of the metal nitride islands are with reduced dislocation densities and side walls with bending of dislocations. The platform of metal nitride islands is further used to build electrically and optically-active devices. The present invention also provides a process for the preparation of a metal nitride platform, selectively, on the array of catalyst sites, in the presence of a reactive gas and precursors and under preferred reaction conditions, to grow metal nitride islands with lateral to vertical size ratios of at least greater than one (1).


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