The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2020
Filed:
Jan. 03, 2018
Applicant:
Rambus Inc., Sunnyvale, CA (US);
Inventors:
Patrick R. Gill, Sunnyvale, CA (US);
David G. Stork, Portola Valley, CA (US);
Assignee:
Rambus Inc., San Jose, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/44 (2006.01); G02B 27/46 (2006.01); H01L 27/146 (2006.01); G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14625 (2013.01); G02B 5/1819 (2013.01); G02B 5/1842 (2013.01); H01L 27/1462 (2013.01); H01L 27/14623 (2013.01); H01L 27/14627 (2013.01); H01L 27/14629 (2013.01);
Abstract
An array of diffraction-pattern generators employ phase anti-symmetric gratings to projects near-field spatial modulations onto a closely spaced array of photoelements. Each generator in the array of generators produces point-spread functions with spatial frequencies and orientations of interest. The generators are arranged in an irregular mosaic with little or no short-range repetition. Diverse generators are shaped and placed with some irregularity to reduce or eliminate spatially periodic replication of ambiguities to facilitate imaging of nearby scenes.