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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10854485 B1

PDFFull Text
Date of Patent:
Dec. 01, 2020

Filed:

Dec. 04, 2019

Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Minsung Kim, Suwon-si, KR;

Myoung Soo Park, Seongnam-si, KR;

Dongyun Yeo, Seoul, KR;

Dougyong Sung, Seoul, KR;

Suho Lee, Seongnam-si, KR;

Yun-Kwang Jeon, Seoul, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Charlee J C. Bennett

Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/683 (2006.01); H01L 21/3065 (2006.01); H01L 21/311 (2006.01); H02N 13/00 (2006.01); H01J 37/32 (2006.01); H01L 21/324 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); H01J 37/321 (2013.01); H01J 37/32724 (2013.01); H01J 37/32733 (2013.01); H01L 21/3065 (2013.01); H01L 21/324 (2013.01); H01L 21/67069 (2013.01); H01L 21/67103 (2013.01); H01L 21/6831 (2013.01); H01L 21/6833 (2013.01); H02N 13/00 (2013.01); H01J 2237/334 (2013.01); H01L 21/31116 (2013.01); H01L 21/32137 (2013.01);
Abstract

An electrostatic chuck, a substrate processing apparatus, and a method of manufacturing a semiconductor device are provided. The electrostatic chuck comprises a chuck base, an insulation plate on the chuck base, a first heater comprising a cell heater in the insulation plate, and a heater controller configured to control the cell heater. The heater controller obtains a resistance of the cell heater and compares the resistance with a threshold value to control a heating power provided to the cell heater.

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