The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Jun. 03, 2019
Applicants:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Carl Zeiss Microscopy Ltd., Cambridge, GB;

Inventors:

Daniela Donhauser, Ulm, DE;

Christian Mueller, Aalen, DE;

Barry Chamley, Mildenhall, GB;

Tobias Volkenandt, Oberkochen, DE;

Dirk Preikszas, Oberkochen, DE;

Giuseppe Pavia, Aalen, DE;

Heiko Stegmann, Dresden, DE;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/304 (2006.01); H01J 37/08 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/304 (2013.01); H01J 37/08 (2013.01); H01J 37/317 (2013.01); H01J 2237/063 (2013.01); H01J 2237/0653 (2013.01); H01J 2237/083 (2013.01); H01J 2237/0805 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/30472 (2013.01); H01J 2237/31749 (2013.01);
Abstract

A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.


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