The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2020

Filed:

Jul. 03, 2018
Applicant:

Cadence Design Systems, Inc., San Jose, CA (US);

Inventors:

Wangyang Zhang, San Jose, CA (US);

Hongzhou Liu, San Jose, CA (US);

Richard J. O'Donovan, San Jose, CA (US);

Michael Tian, San Jose, CA (US);

Assignee:

Cadence Design Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/367 (2020.01); G06F 17/50 (2006.01); G06F 111/10 (2020.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G06F 30/367 (2020.01); G06F 2111/10 (2020.01); G06F 2119/18 (2020.01);
Abstract

A method for performing multiple simulations for a circuit using a first plurality of samples is provided. The method includes obtaining a model of the circuit based on a result of the simulations, determining a failure rate and a confidence interval of the failure rate for the circuit with the performance model. The method includes determining an importance distribution based on the failure rate for the first plurality of samples, wherein the importance distribution is indicative of a probability that a sample value for the circuit will fail the simulation, selecting a second plurality of samples based on the importance distribution, performing a second set of simulations using the second plurality of samples to reduce the confidence interval of the failure rate. When the confidence interval is larger than a value, obtaining an updated performance model and performing new Monte Carlo simulations with new samples.


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