The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2020
Filed:
Dec. 20, 2016
Applicant:
Ev Group E. Thallner Gmbh, St. Florian am Inn, AT;
Inventors:
Bernhard Thallner, St. Florian am Inn, AT;
Boris Povazay, Vienna, AT;
Assignee:
EV Group E. Thallner GmbH, St. Florian am Inn, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/213 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
G02B 26/0833 (2013.01); G03F 7/2051 (2013.01); G03F 7/2053 (2013.01); G03F 7/2057 (2013.01); G03F 7/213 (2013.01); G03F 7/7005 (2013.01); G03F 7/70291 (2013.01); G03F 7/70575 (2013.01); G03F 7/70633 (2013.01);
Abstract
A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.