The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Jul. 03, 2018
Tokyo Electron Limited, Tokyo, JP;
Hiroshi Marumoto, Hillsboro, OR (US);
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A method of drying a substrate after processing the substrate with a processing liquid (e.g., DIW) includes drying the substrate by moving, after forming a liquid film by supplying a first drying liquid (e.g., IPA) having higher volatility than the processing liquid onto the substrate W, a supply position Pof the first drying liquid such that a distance Rfrom a rotation center O of the substrate to the supply position Pof the first drying liquid is gradually increased, while rotating the substrate, to expand a dry region DC in a concentric shape. The drying of the substrate comprises supplying a second drying liquid onto the substrate while supplying the first drying liquid. A distance Rfrom the rotation center to a supply position Pof the second drying liquid is larger than the distance Rfrom the rotation center to the supply position P