The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Nov. 08, 2017
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Hsuan-Chih Chu, Hsinchu, TW;
Chien-Hsun Pan, Hsinchu, TW;
Yen-Yu Chen, Taichung, TW;
Chun-Chih Lin, Taipei, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2006.01); C23C 14/35 (2006.01); C23C 14/34 (2006.01); H01J 37/34 (2006.01); H01L 21/285 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 14/54 (2013.01); C23C 14/3407 (2013.01); C23C 14/355 (2013.01); H01J 37/3458 (2013.01); H01L 21/2855 (2013.01); H01L 21/67253 (2013.01);
Abstract
Sputtering systems and methods are provided. In an embodiment, a sputtering system includes a chamber configured to receive a substrate, a sputtering target positioned within the chamber, and an electromagnet array over the sputtering target. The electromagnet array includes a plurality of electromagnets.