The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2020

Filed:

Mar. 04, 2019
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Dirk Meinhold, Chemnitz, DE;

Florian Brandl, Maxhütte-Haidhof, DE;

Robert Gruenberger, Nandlstadt, DE;

Wolfram Langheinrich, Dresden, DE;

Sebastian Luber, Oberschleißheim, DE;

Roland Meier, Regensburg, DE;

Bernhard Winkler, Regensburg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 19/14 (2006.01); B81B 3/00 (2006.01); B81B 7/00 (2006.01); G01L 9/06 (2006.01);
U.S. Cl.
CPC ...
B81B 3/0072 (2013.01); B81B 3/0021 (2013.01); B81B 7/0048 (2013.01); B81B 2201/0264 (2013.01);
Abstract

A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a semiconductor chip including a substrate having a first surface and a second surface arranged opposite to the first surface; at least one stress-decoupling trench that extends from the first surface into the substrate, where the at least one stress-decoupling trench extends partially into the substrate towards the second surface although not completely to the second surface; a microelectromechanical systems (MEMS) element, including a sensitive area, disposed at the first surface of the substrate and laterally spaced from the at least one stress-decoupling trench; and a stress-decoupling material that fills the at least one stress-decoupling trench and covers the sensitive area of the MEMS element.


Find Patent Forward Citations

Loading…