The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
Nov. 27, 2013
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Weibo Yu, Hsinchu, TW;
Wen-Yu Ku, Hsinchu, TW;
Kuo-Sheng Chuang, Hsinchu, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/67 (2006.01); H01L 21/66 (2006.01); G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30604 (2013.01); G01B 11/0641 (2013.01); H01L 21/67253 (2013.01); H01L 22/20 (2013.01); G01N 2201/025 (2013.01); G01N 2201/061 (2013.01); H01L 22/12 (2013.01);
Abstract
An integrated system operation method is disclosed that includes the following steps: the film of a substrate is measured by a metrology apparatus to obtain a film information. The substrate is moved from the metrology apparatus to a process apparatus adjacent to the transfer apparatus. The film information is sent to the process apparatus. A film treatment is applied to the substrate in accordance with the film information.