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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10838301 B1

PDFFull Text
Date of Patent:
Nov. 17, 2020

Filed:

Mar. 22, 2018

Resist composition, method of forming resist pattern, fluorine-containing compound, and compound

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Tomoyuki Hirano, Kawasaki, JP;

Takaaki Kaiho, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/04 (2006.01); G03F 7/38 (2006.01); C08F 222/18 (2006.01); C08F 224/00 (2006.01); C08F 214/18 (2006.01); C08F 212/04 (2006.01); G03F 7/004 (2006.01); C08F 20/28 (2006.01); C07C 69/708 (2006.01); G03F 7/32 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); C07C 69/73 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C07C 69/708 (2013.01); C07C 69/73 (2013.01); C08F 20/28 (2013.01); C08F 212/04 (2013.01); C08F 214/186 (2013.01); C08F 222/18 (2013.01); C08F 224/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including: a base component which exhibits changed solubility in a developing solution under action of acid and a fluorine additive component which exhibits decomposability to an alkali developing solution, the fluorine additive component including a fluorine resist component having a structural unit derived from a compound represented by general formula (f1-1) in which W represents a polymerizable group-containing group; Rfand Rfeach independently represents a hydrogen atom or an electron-withdrawing group; and Rfrepresents a hydrocarbon group

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