The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2020

Filed:

Nov. 21, 2018
Applicant:

Onto Innovation Inc., Wilmington, MA (US);

Inventor:

Nigel P. Smith, Beaverton, OR (US);

Assignee:

Onto Innovation Inc., Wilmington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G01N 21/95 (2006.01); G01N 21/88 (2006.01); G01B 9/02 (2006.01); G01B 11/30 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01B 9/02011 (2013.01); G01B 11/303 (2013.01); G01N 21/8806 (2013.01); H01L 22/20 (2013.01); G01N 2021/8848 (2013.01);
Abstract

An interferometer uses a phase shift mask that includes an array of pixels that are aligned with a corresponding array of pixels of a detector. Each pixel in the phase shift mask is adapted to produce one of a number of predetermined phase shifts between a test beam and a reference beam. For example, the pixels may be linear polarizers or phase delay elements having one of the number of polarizer orientations or phase delays to produce the predetermined phase shifts between the test beam and the reference beam. The pixels in the phase shift mask are arranged in the array to include each of the predetermined phase shifts in repeating pixel groups in rows that are one column wide, columns that are one row high, or blocks of multiple rows and columns.


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