The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Jan. 22, 2019
Applicant:
Ebara Corporation, Tokyo, JP;
Inventors:
Risa Kimura, Tokyo, JP;
Mitsuhiro Shamoto, Tokyo, JP;
Assignee:
EBARA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 21/10 (2006.01); C25D 17/00 (2006.01); B01F 11/00 (2006.01); C25D 21/12 (2006.01);
U.S. Cl.
CPC ...
C25D 21/10 (2013.01); B01F 11/0082 (2013.01); B01F 11/0091 (2013.01); B01F 11/0097 (2013.01); C25D 17/001 (2013.01); C25D 21/12 (2013.01); B01F 2215/0096 (2013.01);
Abstract
According to one embodiment, a plating apparatus for electroplating a substrate including a non-pattern area is provided. The plating apparatus includes a plating tank for holding the plating solution, an anode configured to be connected to a positive electrode of a power supply, and a paddle configured to move in the plating tank to stir the plating solution held in the plating tank. The paddle is configured such that at least a part of the non-pattern area of the substrate is constantly blocked when the paddle is viewed from the anode while the paddle is stirring the plating solution.