The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2020
Filed:
Dec. 12, 2019
Applicant:
Adaptive Plasma Technology Corp., Icheon-si, KR;
Inventor:
Sang Woo Lee, Suwon-si, KR;
Assignee:
ADAPTIVE PLASMA TECHNOLOGY CORP., Icheon-Si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); H01J 37/32935 (2013.01); H01L 21/67069 (2013.01); H01J 2237/20207 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/24514 (2013.01); H01J 2237/3344 (2013.01);
Abstract
Provided is a separate plasma source coil and a method of controlling the same. The separate plasma source coil includes a center coil group disposed around a coil center and including one or more linear center coils, and an edge coil group disposed around the center coil group and including one or more linear edge coils.