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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10824073 B1

PDFFull Text
Date of Patent:
Nov. 03, 2020

Filed:

Jul. 24, 2018

Radiation-sensitive resin composition and resist pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Katsuaki Nishikori, Tokyo, JP;

Hayato Namai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); C08F 12/22 (2006.01); C09D 125/18 (2006.01); C08F 2/48 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C08F 220/36 (2006.01); C08F 220/38 (2006.01); C08F 212/14 (2006.01); C08F 220/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); C08F 2/48 (2013.01); C08F 12/22 (2013.01); C08F 212/14 (2013.01); C08F 220/16 (2013.01); C08F 220/18 (2013.01); C08F 220/1806 (2020.02); C08F 220/1807 (2020.02); C08F 220/1808 (2020.02); C08F 220/1809 (2020.02); C08F 220/1811 (2020.02); C08F 220/1812 (2020.02); C08F 220/1818 (2020.02); C08F 220/28 (2013.01); C08F 220/281 (2020.02); C08F 220/283 (2020.02); C08F 220/36 (2013.01); C08F 220/365 (2020.02); C08F 220/38 (2013.01); C08F 220/382 (2020.02); C09D 125/18 (2013.01); G03F 7/162 (2013.01);
Abstract

A radiation-sensitive resin composition includes a first compound represented by formula (1), a first polymer comprising an acid-labile group, and a radiation-sensitive acid generator other than the first compound. The radiation-sensitive acid generator includes an onium salt compound. In the formula (1), n is 2 or 3; m is 1 or 2; Yrepresents a monovalent radiation-sensitive onium cation; and L represents a single bond or an organic group having a valency of n. L includes linking moieties each linking two of the carboxylate groups in formula (1). Number of atom(s) included in a linking moiety having a minimum number of bonds among the linking moieties is 0 to 10. In a case where L represents a single bond, n is 2, and in a case where n is 2, m is 1.

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