The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2020

Filed:

Oct. 19, 2018
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Shiyu Zhang, Fremont, CA (US);

Ilya Bezel, Mountain View, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 17/08 (2006.01); G03F 7/20 (2006.01); G01N 21/88 (2006.01); G01N 21/21 (2006.01);
U.S. Cl.
CPC ...
G02B 17/0892 (2013.01); G01N 21/211 (2013.01); G01N 21/8806 (2013.01); G03F 7/70225 (2013.01); G01N 2021/213 (2013.01);
Abstract

A plasma light source with lamp house correction is disclosed. The system may include a pump source configured to generate pump illumination. The pump illumination may be directed, by an elliptical reflector element, to a volume of gas contained within a plasma lamp in order to generate a plasma. The plasma may be configured to generate broadband illumination. The system may also include a correction plate and/or an aspherical elliptical reflector element configured to alter the pump illumination to correct for aberrations introduced by the plasma lamp. The system may also include an additional aspherical correction plate configured to alter the broadband illumination to correct for aberrations introduced by optical elements of the system.


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