The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2020

Filed:

Aug. 13, 2018
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Saar Shabtay, Mismeret, IL;

Idan Kaizerman, Meitar, IL;

Amir Watchs, Casesarea, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06K 9/68 (2006.01); G06K 9/52 (2006.01); G06K 9/46 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06K 9/52 (2013.01); G06K 9/685 (2013.01); G06T 7/0012 (2013.01); G06K 2009/4666 (2013.01); G06T 2207/10056 (2013.01); G06T 2207/20112 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Data indicative of a group of defect candidates may be obtained. The data may be indicative of a group of defect candidates and may include values of attributes for each defect candidate of the group of defect candidates. Sub-groups of defect candidates may be iteratively selected for review using a review recipe to classify the defect candidates in each selected sub-group based on the values of attributes of respective defect candidates and classification results of previously reviewed defect candidates. The sub-groups may be selected until a sampling stop condition is fulfilled to obtain a classification output for the wafer. Instructions specifying at least one of the sampling stop condition, the inspection recipe, or the review recipe may be altered and additional defect candidates in a next wafer may be classified by using the altered instructions.


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