The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Jan. 28, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Pramit Manna, Sunnyvale, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Rui Cheng, Santa Clara, CA (US);
Erica Chen, Cupertino, CA (US);
Ziqing Duan, San Jose, CA (US);
Abhijit Basu Mallick, Palo Alto, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01); H01L 23/31 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76224 (2013.01); H01L 21/02123 (2013.01); H01L 21/76283 (2013.01); H01L 21/76286 (2013.01); H01L 21/76837 (2013.01); H01L 23/3178 (2013.01); H01L 29/0649 (2013.01);
Abstract
Methods for seam-less gapfill comprising sequentially depositing a film with a seam, reducing the height of the film to remove the seam and repeating until a seam-less film is formed. Some embodiments include optional film doping and film treatment (e.g., ion implantation and annealing).