The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Jul. 05, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Atashi Basu, Menlo Park, CA (US);
Srinivas D. Nemani, Sunnyvale, CA (US);
Ellie Y. Yieh, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); H01L 21/02 (2006.01); C23C 16/452 (2006.01); C23C 16/56 (2006.01); C23C 16/505 (2006.01); C23C 16/04 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02219 (2013.01); C23C 16/045 (2013.01); C23C 16/345 (2013.01); C23C 16/452 (2013.01); C23C 16/45523 (2013.01); C23C 16/505 (2013.01); C23C 16/56 (2013.01); H01L 21/0217 (2013.01); H01L 21/02274 (2013.01);
Abstract
Methods for depositing silicon nitride films with higher nitrogen content are described. Certain methods comprise exposing a substrate to a silicon-nitrogen precursor and ammonia plasma to form a flowable polymer, and then curing the polymer to form a silicon nitride film. Certain methods cure the flowable polymer without the use of a UV-cure process. Also described is the film generated by the methods described above.