The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Jul. 09, 2015
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Koji Mitsuhashi, Miyagi, JP;
Satoshi Nishimura, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 4/11 (2016.01); H01J 37/32 (2006.01); C23C 4/12 (2016.01); C23C 4/06 (2016.01); C23C 4/18 (2006.01); C23C 4/02 (2006.01); C25D 11/04 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 4/12 (2013.01); C23C 4/02 (2013.01); C23C 4/06 (2013.01); C23C 4/11 (2016.01); C23C 4/18 (2013.01); C23C 16/45565 (2013.01); C25D 11/04 (2013.01); H01J 37/3244 (2013.01); H01J 37/32477 (2013.01); H01J 37/32559 (2013.01); H01J 37/32633 (2013.01);
Abstract
A component for use in a plasma processing apparatus, which is to be exposed to a plasma, includes a base material, an alumite layer and a thermally sprayed film. The base material has a plurality of through holes and a rough surface at which one end of each of the through holes is opended. The alumite layer is formed on a surface of the base material having the rough surface by an anodic oxidation process. The thermally sprayed film is formed on the rough surface with the alumite layer therebetween.