The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Feb. 24, 2017
Applicant:

Shibaura Mechatronics Corporation, Yokohama-shi, Kanagawa, JP;

Inventors:

Koichi Hamada, Yokohama, JP;

Nobuo Kobayashi, Yokohama, JP;

Assignee:

SHIBAURA MECHATRONICS CORPORATION, Yokohama-Shi, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01L 21/306 (2006.01); G02F 1/13 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67075 (2013.01); G02F 1/1303 (2013.01); H01L 21/30604 (2013.01); H01L 21/6708 (2013.01); H01L 21/67051 (2013.01); H01L 21/67253 (2013.01); H01L 21/68764 (2013.01);
Abstract

According to an embodiment, a substrate treatment apparatus includes, a substrate support unit supporting a substrate, a rotary unit rotating the substrate, a treatment liquid supply unit supplying treatment liquid to a surface of the substrate, and a controller performing liquid discharge treatment to change liquid discharge velocity at which the treatment liquid is discharged from the substrate, at preset predetermined timing, during substrate treatment in which the treatment liquid is supplied while the substrate is rotated, with the treatment continued.


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