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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10804083 B1

PDFFull Text
Date of Patent:
Oct. 13, 2020

Filed:

Jul. 09, 2014

Cathode assembly, physical vapor deposition system, and method for physical vapor deposition

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Yi-Chieh Wang, Taipei, TW;

Cheng-Kuo Wang, Zhubei, TW;

Chung-Han Lin, Zhubei, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;

Attorney:

Maschoff Brennan

Primary Examiner:

Jason Berman

Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); C23C 14/54 (2006.01); C23C 14/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/347 (2013.01); C23C 14/3407 (2013.01); C23C 14/52 (2013.01); C23C 14/54 (2013.01); C23C 14/543 (2013.01); H01J 37/3435 (2013.01); H01J 37/3479 (2013.01); H01J 37/3497 (2013.01);
Abstract

A cathode assembly for a physical vapor deposition (PVD) system includes a target holder and a thickness detector. The target holder is for holding a target, in which the target has a first major surface and a second major surface. The first major surface and the second major surface are respectively proximal and distal to the target holder. The thickness detector is disposed on the target holder. At least one portion of the first major surface is exposed to the thickness detector for allowing the thickness detector to detect the thickness of the target through the first major surface.

Find Patent Forward Citations

Wang, Yi-Chieh. (2020). Cathode assembly, physical vapor deposition system, and method for physical vapor deposition (U.S. Patent No. 10804083). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10804083

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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