The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Jun. 26, 2017
Applicants:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Aledia, Grenoble, FR;

Inventors:

Benoit Amstatt, Grenoble, FR;

Florian Dupont, Grenoble, FR;

Ewen Henaff, Fontaine, FR;

Berangere Hyot, Eybens, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 33/18 (2010.01); H01L 33/00 (2010.01); H01L 33/24 (2010.01); C03B 23/02 (2006.01); C03B 23/04 (2006.01); C03B 25/04 (2006.01); C30B 29/60 (2006.01); C30B 23/02 (2006.01); C30B 23/04 (2006.01); C30B 25/04 (2006.01); C30B 25/18 (2006.01);
U.S. Cl.
CPC ...
C30B 29/607 (2013.01); C30B 23/025 (2013.01); C30B 23/04 (2013.01); C30B 25/04 (2013.01); C30B 25/183 (2013.01); C30B 29/60 (2013.01); C30B 29/602 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02381 (2013.01); H01L 21/02433 (2013.01); H01L 21/02491 (2013.01); H01L 21/02502 (2013.01); H01L 21/02603 (2013.01); H01L 33/007 (2013.01); H01L 33/18 (2013.01); H01L 33/24 (2013.01); H01L 21/02639 (2013.01);
Abstract

A nucleation structure for the epitaxial growth of three-dimensional semiconductor elements, including a substrate including a monocrystalline material forming a growth surface, a plurality of intermediate portions made of an intermediate crystalline material epitaxied from the growth surface and defining an upper intermediate surface, and a plurality of nucleation portions, made of a material including a transition metal forming a nucleation crystalline material, each epitaxied from the upper intermediate surface, and defining a nucleation surface suitable for the epitaxial growth of a three-dimensional semiconductor element.


Find Patent Forward Citations

Loading…