The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
May. 07, 2019
Ebara Corporation, Tokyo, JP;
Toshiba Memory Corporation, Tokyo, JP;
Yu Ishii, Tokyo, JP;
Hiroyuki Kawasaki, Tokyo, JP;
Kenichi Nagaoka, Tokyo, JP;
Kenya Ito, Tokyo, JP;
Masako Kodera, Kanagawa-ken, JP;
Hiroshi Tomita, Kanagawa-ken, JP;
Takeshi Nishioka, Kanagawa-ken, JP;
EBARA CORPORATION, Tokyo, JP;
Toshiba Memory Corporation, Tokyo, JP;
Abstract
A substrate processing apparatus removes foreign substances from a substrate at high removal efficiency. The substrate processing apparatus includes: a scrubber to perform surface processing of the substrate by bringing a scrubbing member into sliding contact with a first surface of the substrate, a hydrostatic support mechanism for supporting a second surface of the substrate via fluid pressure without contacting the substrate, the second surface being an opposite surface of the first surface, a cleaner to clean the processed substrate, and a dryer to dry the cleaned substrate. The scrubber brings the scrubbing member into sliding contact with the first surface while rotating the scrubbing member about a central axis of the scrubber.