The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
Apr. 18, 2018
Tokyo Electron Limited, Tokyo, JP;
Katsutoshi Ishii, Yamanashi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a substrate processing apparatus that includes: a process chamber in which a substrate is accommodated to be processed; a plurality of quartz gas nozzles configured to supply, into the process chamber, a plurality of process gasses capable of generating reaction products by reacting the plurality of process gasses with each other; an evacuation device configured to evacuate an interior portion of the process chamber; a bypass pipe configured to connect a quartz gas nozzle among the plurality of quartz gas nozzles to the evacuation device; and a coating gas nozzle configured to supply at least one of a silicon-containing gas and an oxidizing gas capable of forming a SiOcoating film inside the quartz gas nozzle connected to the evacuation device in a state in which the inside of the quartz gas nozzle connected to the evacuation device is evacuated by the evacuation device.