The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2020
Filed:
Apr. 30, 2019
Cadence Design Systems, Inc., San Jose, CA (US);
Abner Luis Panho Marciano, Belo Horizonte, BR;
Matheus Fonseca, Betum, BR;
Thamara Karen Cunha Andrade, Ituna, BR;
Raquel Lara dos Santos Pereira, Belo Horizonte, BR;
Fabiano Cruz Peixoto, Belo Horizonte, BR;
Rodolfo Santos Teixeira, Belo Horizonte, BR;
Rafael Gontijo Hamdan, Belo Horizonte, BR;
Bruno Andrade Pereira, Belo Horizonte, BR;
CADENCE DESIGN SYSTEMS, INC., San Jose, CA (US);
Abstract
In the described examples, a model impact monitor can include an electronic design automation (EDA) manager that communicates with a plurality of EDA programs, wherein each EDA program generates a model set for a register-transfer level (RTL) design comprising a list of RTL operations. The model impact monitor can also include an adaptive model interface that records changes to the RTL operations of the RTL design and measures a change in performance characteristics of each of the plurality of EDA programs based on a respective one of the changes in the RTL operations of the RTL design.