The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2020
Filed:
Apr. 09, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G03F 7/20 (2006.01); G01B 11/26 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70625 (2013.01); G01B 11/26 (2013.01); G03F 7/70633 (2013.01); G03F 7/70641 (2013.01); G03F 7/70683 (2013.01);
Abstract
Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.
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Cheng, Su-Ting. (2020). Metrology method and apparatus, computer program and lithographic system (U.S. Patent No. 10788757). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10788757
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