The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2020

Filed:

Oct. 25, 2018
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Yong-Sheng Huang, Hsinchu, TW;

Ming-Chyi Liu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2017.01); H01L 27/11568 (2017.01); H01L 21/28 (2006.01); H01L 23/528 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); H01L 23/5283 (2013.01); H01L 27/11568 (2013.01); H01L 29/40117 (2019.08);
Abstract

A memory device and a manufacturing method are provided. The memory device includes a plurality of memory cells stacked on a substrate. The memory cell includes two conductive patterns, a channel pillar, a gate pattern and a charge storage layer. The two conductive patterns are stacked on the substrate. The channel pillar extends between the two conductive patterns along a stacking direction of the two conductive patterns, and is electrically connected with the two conductive patterns. The gate pattern is disposed between the two conductive patterns and located at a sidewall of the channel pillar. The charge storage layer is disposed between the gate pattern and the channel pillar.


Find Patent Forward Citations

Loading…