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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10784138 B1

PDFFull Text
Date of Patent:
Sep. 22, 2020

Filed:

Feb. 09, 2018

Substrate processing system and substrate transfer method

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Takahiro Abe, Oshu, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Primary Examiner:

Paul J Gray

Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/673 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67766 (2013.01); H01L 21/67017 (2013.01); H01L 21/67389 (2013.01); H01L 21/67769 (2013.01); H01L 21/67772 (2013.01); H01L 21/67775 (2013.01);
Abstract

There is provided a substrate processing system, including: a carrier transfer region in which a carrier that accommodates a substrate is transferred to a substrate processing apparatus, and a substrate transfer region in which the substrate accommodated in the carrier is transferred to a processing furnace, the substrate transfer region being partitioned from the carrier transfer region by a partition wall; a transfer port formed in the partition wall and through which the substrate is transferred between the carrier transfer region and the substrate transfer region; an opening/closing door configured to open and close the transfer port; and a pressure equalizing part configured to substantially equalize a pressure of the substrate transfer region and a pressure of a space surrounded by the carrier and the opening/closing door.

Find Patent Forward Citations

Abe, Takahiro. (2020). Substrate processing system and substrate transfer method (U.S. Patent No. 10784138). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10784138

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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