The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Mar. 15, 2018
Applicant:
Hitachi Kokusai Electric Inc., Tokyo, JP;
Inventors:
Assignee:
KOKUSAI ELECTRIC CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); C23C 16/32 (2006.01); C23C 16/40 (2006.01); H01L 23/532 (2006.01); H01L 21/768 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31 (2013.01); C23C 16/325 (2013.01); C23C 16/401 (2013.01); C23C 16/4401 (2013.01); C23C 16/455 (2013.01); C23C 16/45534 (2013.01); H01L 21/0228 (2013.01); H01L 21/02126 (2013.01); H01L 21/02131 (2013.01); H01L 21/02211 (2013.01); H01L 21/02321 (2013.01); H01L 21/02337 (2013.01); H01L 21/768 (2013.01); H01L 23/532 (2013.01);
Abstract
There is provided a technique that includes: (a) providing a substrate having a film containing a predetermined element, oxygen and carbon formed on a surface of the substrate; and (b) modifying at least a surface of the film by supplying a carbon-free fluorine-based gas to the substrate under a condition in which etching of the film does not occur.