The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2020

Filed:

Oct. 31, 2018
Applicant:

Bruker Axs Gmbh, Karlsruhe, DE;

Inventors:

Roger D. Durst, Pfinztal, DE;

Christoph Ollinger, Karlsruhe, DE;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/295 (2006.01); H01J 37/20 (2006.01); H01J 37/26 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/2955 (2013.01); H01J 37/20 (2013.01); H01J 37/26 (2013.01); H01J 37/265 (2013.01); H01J 37/28 (2013.01); H01J 37/295 (2013.01);
Abstract

An electron diffraction imaging system for imaging the three-dimensional structure of a single target molecule of a sample uses an electron source that emits a beam of electrons toward the sample, and a two-dimensional detector that detects electrons diffracted by the sample and generates an output indicative of their spatial distribution. A sample support is transparent to electrons in a region in which the sample is located, and is rotatable and translatable in at least two perpendicular directions. The electron beam has an operating energy between 5 keV and 30 keV, and beam optics block highly divergent electrons to limit the beam diameter to no more than three times the size of the sample molecule and provide a lateral coherence length of at least 15 nm. An adjustment system adjusts the sample support position in response to the detector output to center the target molecule in the beam.


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