The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Oct. 27, 2017
Synopsys, Inc., Mountain View, CA (US);
John R. Studders, Durham, NC (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
A DRC tool optimized for analyzing early-stage ('dirty') IC layout designs by performing one or more of (a) automatically selectively focusing DRC processing to selected regions (i.e., layers and/or cells) of a dirty IC layout design that are most likely to provide useful error information to a user, (b) automatically selectively ordering and/or limiting rule checks performed during DRC processing to provide the user with a manageable amount of error data in a predetermined reasonable amount of time, and (c) automatically providing error data in a graphical manner using a contrasting dot to indicate the location of each rule violation, whereby relevant problem areas of the dirty IC layout design are easily identified for correction by a human user, and non-relevant areas (e.g., missing block regions) can be efficiently identified and ignored, thereby facilitating efficient modification of the IC layout design.