The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2020
Filed:
Mar. 27, 2014
Applicant:
Mitsubishi Materials Corporation, Tokyo, JP;
Inventor:
Yoshinobu Nakada, Ageo, JP;
Assignee:
MITSUBISHI MATERIALS CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 29/02 (2006.01); H01L 29/04 (2006.01); F27B 14/06 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02123 (2013.01); F27B 14/06 (2013.01); H01L 21/02238 (2013.01); H01L 21/02247 (2013.01); H01L 23/562 (2013.01); H01L 29/02 (2013.01); H01L 29/04 (2013.01); H01L 2924/0002 (2013.01);
Abstract
A silicon member and a method of producing the silicon member are provided. Cracking is suppressed in the silicon member even if the silicon member is used in a condition where it is heated. The silicon memberincludes a coating layerthat coats a surface of the silicon memberwherein the coating layeris composed of a product of silicon formed by reaction of the silicon on the surface, and a thickness of the coating layer is 15 nm or more and 600 nm or less. It is preferable that the coating layer is a silicon oxide film or a silicon nitride film.