The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2020

Filed:

Mar. 22, 2019
Applicant:

Kabushiki Kaisha Toyota Chuo Kenkyusho, Nagakute-shi, Aichi, JP;

Inventors:

Tsutomu Uesugi, Nagakute, JP;

Masakazu Kanechika, Nagakute, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 29/423 (2006.01); H01L 29/739 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7813 (2013.01); H01L 29/0865 (2013.01); H01L 29/1095 (2013.01); H01L 29/4236 (2013.01); H01L 29/7397 (2013.01);
Abstract

A semiconductor device may include: a semiconductor layer; and a trench gate. The semiconductor layer may include: a first semiconductor region of a first conductive type; a second semiconductor region of a second conductive type provided above the first semiconductor region and facing a side surface of the trench gate; and a third semiconductor region of the first conductive type provided above the second semiconductor region, separated from the first semiconductor region by the second semiconductor region, and facing the side surface of the trench gate. The first semiconductor region may include: a lower semiconductor region; and an upper semiconductor region disposed between the lower semiconductor region and the second semiconductor region and having a lower impurity concentration than the lower semiconductor region. The upper semiconductor region may be disposed at a shallower position than the trench gate and face the side surface of the trench gate.


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