The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2020

Filed:

Jul. 01, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Wen-Shun Lo, Hsinchu County, TW;

Yu-Chi Chang, Kaohsiung, TW;

Felix Ying-Kit Tsui, Cupertino, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/78 (2006.01); H01L 21/762 (2006.01); H01L 21/265 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1041 (2013.01); H01L 21/26513 (2013.01); H01L 21/26586 (2013.01); H01L 21/76237 (2013.01); H01L 29/66568 (2013.01); H01L 29/78 (2013.01); H01L 29/7833 (2013.01);
Abstract

A semiconductor device includes a semiconductor substrate, a gate electrode, a channel region, a pair of source/drain regions and a threshold voltage adjusting region. The gate electrode is over the semiconductor substrate. The channel region is between the semiconductor substrate and the gate electrode. The channel region includes a pair of first sides opposing to each other in a channel length direction, and a pair of second sides opposing to each other in a channel width direction. The source/drain regions are adjacent to the pair of first sides of the channel region in the channel length direction. The threshold voltage adjusting region covers the pair of second sides of the channel region in the channel width direction, and exposing the pair of first sides of the channel region in the channel length direction.


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