The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Mar. 04, 2016
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Chung-Hsien Liao, Hsinchu, TW;
Wen-Pao Tsai, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32431 (2013.01); H01J 37/32082 (2013.01); H01J 37/32467 (2013.01); H01J 37/32477 (2013.01);
Abstract
A chamber of a plasma system includes a chamber wall defining a plasma processing area, a substrate supporter configured to support a substrate in the plasma processing area, and a liner located in the plasma processing area and separating the chamber wall from the plasma processing area. A liner for a plasma system and a method for installing a liner to a plasma system are also provided.
Liao, Chung-Hsien. (2020). Chamber of plasma system, liner for plasma system and method for installing liner to plasma system (U.S. Patent No. 10763082). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10763082
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile