The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Aug. 26, 2019
Globalfoundries Inc., Grand Cayman, KY;
Richard Good, Saratoga Springs, NY (US);
Dinesh Balasubra Manian, Clifton Park, NY (US);
Houssam Lazkani, Ballston Spa, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
Methods of controlling an across-wafer profile of a semiconductor process, as well as related systems and computer program products. A target profile of a semiconductor process over a radius of a wafer is fit to a polynomial. A plurality of gain matrices between a first plurality of process inputs and a plurality of polynomial coefficients of the polynomial are determined. An offset is estimated between the plurality of polynomial coefficients and an effect of the first plurality of process inputs. An objective function is defined as an integral of a squared deviation between an estimated profile and the target profile over the radius of the wafer. A second plurality of process inputs are mapped to the objective function by vector convolution using the plurality of gain matrices. The objective function is solved to optimize the second plurality of process inputs.