The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Oct. 03, 2016
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Thomas I. Wallow, San Carlos, CA (US);

Peng-cheng Yang, Shenzhen, CN;

Adam Lyons, San Jose, CA (US);

Mir Farrokh Shayegan Salek, Santa Clara, CA (US);

Hermanus Adrianus Dillen, Maarheeze, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70441 (2013.01); G03F 1/36 (2013.01); G03F 7/7065 (2013.01); G03F 7/70508 (2013.01); G03F 7/70625 (2013.01);
Abstract

A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.


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