The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Feb. 23, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/029 (2006.01); C07C 381/12 (2006.01); G03F 7/004 (2006.01); C08L 33/06 (2006.01); C07D 335/02 (2006.01); C07C 309/20 (2006.01); C07C 69/00 (2006.01); C07D 333/46 (2006.01); C07C 309/12 (2006.01); G03F 7/20 (2006.01); C08K 5/098 (2006.01); C08K 5/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 69/00 (2013.01); C07C 309/12 (2013.01); C07C 309/20 (2013.01); C07C 381/12 (2013.01); C07D 333/46 (2013.01); C07D 335/02 (2013.01); C08L 33/06 (2013.01); G03F 7/0045 (2013.01); G03F 7/0048 (2013.01); G03F 7/029 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); C07C 2603/74 (2017.05); C08K 5/098 (2013.01); C08K 5/42 (2013.01); G03F 7/2059 (2013.01);
Abstract
The present invention provides a sulfonium salt capable of providing a resist composition having few defects in photolithography where a high energy beam is used as a light source, and excellent in lithography performance by controlling acid diffusion. The present invention was accomplished by a sulfonium salt including an anion and a cation, the cation having a partial structure represented by the following general formula (1), except for a sulfonium salt having a cation represented by the following general formula (1'),