The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2020
Filed:
Jan. 18, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Sidharth Bhatia, Santa Cruz, CA (US);
Edward P. Hammond, IV, Hillsborough, CA (US);
Bhaskar Kumar, Santa Clara, CA (US);
Anup Kumar Singh, Santa Clara, CA (US);
Vivek Bharat Shah, Sunnyvale, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/3065 (2006.01); G06T 7/00 (2017.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); G06T 7/0004 (2013.01); H01J 37/32981 (2013.01); H01L 21/3065 (2013.01); H01J 37/321 (2013.01); H01J 2237/334 (2013.01);
Abstract
Embodiments of the present disclosure relate to a method and an apparatus for monitoring plasma behavior inside a plasma processing chamber. In one example, a method for monitoring plasma behavior includes acquiring at least one image of a plasma, and determining a plasma parameter based on the at least one image.