The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2020
Filed:
Oct. 16, 2018
Rigaku Corporation, Tokyo, JP;
RIGAKU CORPORATION, Tokyo, JP;
Abstract
A processing apparatus that enables margin correction of X-ray intensity data includes a calculation unit configured to calculate an expansion rate of X-ray intensity data detected in a unit region on a marginal side on a basis of an intensity distribution resulted from detection of uniform X-ray and a first function generation unit configured to generate an allocation function that allocates the X-ray intensity data detected in the unit region on the marginal side to an outside unit region, on the basis of the expansion rate. Enabling margin correction on the basis of the intensity distribution resulting from detection of uniform X-ray makes it possible to correct the distortion of intensity distribution on the marginal side. As a result, it is possible to expand the detection region of X-ray intensity data.