The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2020

Filed:

Sep. 02, 2014
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Tzu-Sou Chuang, Hsinchu, TW;

Chi-Wen Kuo, Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 1/28 (2006.01); G01Q 60/24 (2010.01); G01N 27/02 (2006.01); G01N 27/72 (2006.01); G01Q 60/38 (2010.01); G01Q 60/46 (2010.01); G01Q 60/50 (2010.01); G01Q 60/26 (2010.01); G01Q 60/30 (2010.01); G01N 21/65 (2006.01); G01B 5/00 (2006.01); G01N 21/84 (2006.01);
U.S. Cl.
CPC ...
G01N 1/2813 (2013.01); G01N 21/65 (2013.01); G01Q 60/24 (2013.01); G01N 2021/8427 (2013.01); G01Q 60/26 (2013.01); G01Q 60/30 (2013.01); G01Q 60/50 (2013.01);
Abstract

A method for inspecting a process solution is provided. In this method, a process solution is disposed on a surface of a substrate. A liquid of the process solution is removed to form an inspection sample by a spinning method. The surface of the substrate of the inspection sample is inspected by the surface inspection device to identify whether a residue of the process solution is left on the surface of the substrate after removing the liquid of the process solution. Further, an apparatus for inspecting a process solution and a sample preparation apparatus in inspection are also provided herein.


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