The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2020

Filed:

Sep. 25, 2018
Applicant:

The Swatch Group Research and Development Ltd, Marin, CH;

Inventors:

Stewes Bourban, Chabrey, CH;

Pascal Grossenbacher, Neuchatel, CH;

Jean-Claude Martin, Montmollin, CH;

Vladislav Spassov, Praz, CH;

Cecile Barron, Corcelles, CH;

Lionel Blaser, Corcelles, CH;

Yann Caloz, Pampigny, CH;

Cyrille Gernez, Boudry, CH;

Stephane Lauper, Cortaillod, CH;

Ahmad Odeh, Renens, CH;

Simon Springer, Bern, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G04B 47/04 (2006.01); A44C 17/04 (2006.01); C25D 7/00 (2006.01); C25D 1/00 (2006.01); C25D 5/02 (2006.01); A44C 27/00 (2006.01);
U.S. Cl.
CPC ...
A44C 17/04 (2013.01); A44C 27/00 (2013.01); C25D 1/003 (2013.01); C25D 5/022 (2013.01); C25D 7/005 (2013.01); G04B 47/042 (2013.01);
Abstract

A method for assembling a stone on a setting support, the stone being cut to exhibit a table, a crown, a girdle and a pavilion. A substrate with a recess for the stone, the recess forming, between the substrate and the stone, a peripheral free space in the vicinity of the girdle and of the zones of the crown and of the pavilion contiguous to the girdle, the peripheral free space including a bottom having a conductive surface. Electroplating, in the peripheral free space, a metal layer in the vicinity of the girdle and of the zones of the crown and of the pavilion contiguous to the girdle, so as to confine the girdle in the metal layer to form, around the girdle, the setting support. The stone and its setting support are released from the substrate.


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