The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Oct. 03, 2019
Applicant:

Spin Memory, Inc., Fremont, CA (US);

Inventors:

Bartlomiej Adam Kardasz, Pleasanton, CA (US);

Mustafa Michael Pinarbasi, Morgan Hill, CA (US);

Jacob Anthony Hernandez, Morgan Hill, CA (US);

Assignee:

Spin Memory, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 43/10 (2006.01); H01L 43/12 (2006.01); H01L 43/08 (2006.01); H01F 10/32 (2006.01); H01F 41/30 (2006.01);
U.S. Cl.
CPC ...
H01L 43/10 (2013.01); H01F 10/3286 (2013.01); H01F 41/302 (2013.01); H01L 43/08 (2013.01); H01L 43/12 (2013.01); H01F 10/3272 (2013.01);
Abstract

A perpendicular synthetic antiferromagnetic (pSAF) structure and method of making such a structure is disclosed. The pSAF structure comprises a first high perpendicular Magnetic Anisotropy (PMA) multilayer and a second high PMA layer separated by a thin Ruthenium layer. Each PMA layer is comprised of a first cobalt layer and a second cobalt layer separated by a nickel/cobalt multilayer. After each of the first and second PMA layers and the Ruthenium exchange coupling layer are deposited, the resulting structure goes through a high temperature annealing step, which results in each of the first and second PMA layers having a perpendicular magnetic anisotropy.


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