The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Sep. 08, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Zhenxing Bi, Niskayuna, NY (US);

Kangguo Cheng, Schenectady, NY (US);

Shogo Mochizuki, Clifton Park, NY (US);

Hao Tang, Albany, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 27/092 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 21/76877 (2013.01); H01L 27/092 (2013.01); B81B 2203/0315 (2013.01); B82Y 40/00 (2013.01); H01L 21/76898 (2013.01);
Abstract

A self-assembled heteroepitaxial oxide nanocomposite film including alternating layers of a first metal oxide having a first melting point and a second metal oxide having a second melting point that differs from the first melting point is formed in an opening formed in a semiconductor substrate. After forming a metal or metal alloy via structure in the semiconductor substrate, first and second thermal treatments are performed to remove each layer of first or second metal oxide providing a nanoporous membrane.


Find Patent Forward Citations

Loading…