The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Nov. 08, 2017
Applicant:

Asahi Kasei Kabushiki Kaisha, Tokyo, JP;

Inventors:

Akira Yoshikawa, Tokyo, JP;

Tomohiro Morishita, Tokyo, JP;

Motoaki Iwaya, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/15 (2006.01); H01L 21/02 (2006.01); H01L 31/0304 (2006.01); H01L 31/036 (2006.01); H01L 31/18 (2006.01); H01L 33/00 (2010.01); H01L 33/16 (2010.01); H01L 33/32 (2010.01); H01L 31/167 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0262 (2013.01); H01L 31/036 (2013.01); H01L 31/03044 (2013.01); H01L 31/1856 (2013.01); H01L 33/007 (2013.01); H01L 33/16 (2013.01); H01L 33/32 (2013.01); H01L 31/167 (2013.01);
Abstract

A nitride semiconductor substrate includes a sapphire substrate and a nitride semiconductor layer formed thereon and containing a group III element including Al and nitrogen as a main component. A surface of the sapphire substrate where the nitride semiconductor layer is formed includes recesses having a maximum opening size of from 2 nm to 60 nm in an amount of from 1×10pieces to 1×10pieces per cm. The recesses and surfaces immediately above the recesses form spaces. Of a surface of the nitride semiconductor layer on the sapphire substrate side, a height difference ΔH between a surface immediately above of each recess and a surface in contact with a flat surface is 10 nm or less. A portion of the nitride semiconductor layer above each recess has a crystalline structure produced by growth along a polar plane of the group III element.


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