The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Sep. 26, 2018
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventor:
Fumitaka Shoji, Kawasaki, JP;
Assignee:
ASM IP Holdings B.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02186 (2013.01); C23C 16/405 (2013.01); C23C 16/45542 (2013.01); H01J 37/3244 (2013.01); H01J 37/32522 (2013.01); H01J 37/32853 (2013.01); H01L 21/0228 (2013.01); H01L 21/02205 (2013.01); H01L 21/02274 (2013.01); H01J 37/32091 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3323 (2013.01);
Abstract
Examples of a plasma film forming method include repeating feeding material gas onto a substrate placed on a susceptor via a shower head provided to oppose the susceptor, performing plasma film formation on the substrate by applying high frequency power to the shower head while providing reactant gas onto the substrate, and performing post-purge of discharging the gas used in the plasma film formation while heating the shower head, for a time longer than 0.1 seconds, a plurality of times in this order.