The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Mar. 19, 2019
Rigaku Corporation, Tokyo, JP;
Takeshi Osakabe, Tokyo, JP;
Toru Mitsunaga, Tokyo, JP;
RIGAKU CORPORATION, Tokyo, JP;
Abstract
An X-ray diffraction apparatus includes: an X-ray source (); a first incident path letting the generated X-ray beam pass therethrough; a second incident path letting the generated X-ray beam be reflected by a multilayer film mirror and letting the reflected X-ray beam pass therethrough in parallel with the X-ray beam having passed through the first incident path. A movement mechanism is provided moving the X-ray source () between the first incident path and the second incident path while preserving respective relative positions thereof. An incident slit () allows an X-ray beam to be incident on a sample S pass therethrough; and a sample support stage () supports the sample S at a position fixed relative to the incident slit ().