The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Dec. 07, 2016
Applicant:

Siltronic Ag, Munich, DE;

Inventors:

Karl Mangelberger, Ach, AT;

Walter Heuwieser, Stammham, DE;

Michael Skrobanek, Freiberg, DE;

Assignee:

SILTRONIC AG, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); C30B 15/04 (2006.01); C30B 30/04 (2006.01); C30B 29/06 (2006.01); C30B 15/30 (2006.01);
U.S. Cl.
CPC ...
C30B 15/04 (2013.01); C30B 15/305 (2013.01); C30B 29/06 (2013.01); C30B 30/04 (2013.01);
Abstract

The invention relates to a silicon wafer having a radial variation of oxygen concentration of less than 7%, determined over the entire radius of the silicon wafer. The wafers are produced in the Pregion with rotation of crystal and crucible in the same direction, and in the presence of a horizontal magnetic field of defined intensity.


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