The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Jun. 27, 2013
Applicant:

Avaya Inc., Basking Ridge, NJ (US);

Inventors:

Reinhard P. Klemm, Basking Ridge, NJ (US);

Doree Duncan Seligmann, New York, NY (US);

Assignee:

Avaya Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04L 29/08 (2006.01); H04W 4/21 (2018.01);
U.S. Cl.
CPC ...
H04L 67/306 (2013.01); H04W 4/21 (2018.02);
Abstract

An event selection system for computing user migration pattern across social network pages is provided. The event selection system includes a monitor module to monitor predetermined activities of social media users on preconfigured resources. The event selection system further includes a profile module to build a social media user profile based on the monitored activities of the social media users. The event selection system further includes a computing module to compute user migration patterns based on the social media user profiles. The event selection system further includes a display module to display the user migration patterns on a system user terminal. The event selection system further includes a reporting module configured to produce a report based on the monitored social media user activities.


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